Rochester
Institute of Technology uses EWL Lithography Method to make 26
Nanometer Computer Chips
February 10th, 2006
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Bruce Smith |
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Bruce Smith,
Rochester Institute of Technology (RTI) professor of microelectronic
engineering and also the director of the Center for Nanolithography
Research in the Kate Gleason College of Engineering, has led a team
of engineering students to develop a new process of Nanolithography
that uses evanescent wave lithography (EWL) to produce the smallest
ever semiconductor device geometry.
Yongfa Fan,
who is a doctoral student in RIT’s Microsystems engineering Ph.D.
program, achieved the 26 nanometer size, which was only previously
made possible by extreme ultraviolet wavelength methods. This
development advancement in technology is at least five years sooner
than projected, based on the International Technology Roadmap for
Semiconductors (http://public.itrs.net).
"Immersion
lithography has pushed the limits of optical imaging," Smith says.
"Evanescent wave lithography continues to extend this reach well
into the future. The results are very exciting as images can be
formed that are not supposed to exist."
This is the
technology of the future, and the EWL method will make developing
nanotechnology and microelectronics devices even more prominent in
the years to come.
By
Nicole Wilson
Best Syndication Staff Writer
Keywords and misspellings: nano meter
technolgys nano-metre smallest size breakthrew nano-technolgy
litography etching |
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