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Rochester Institute of Technology uses EWL Lithography Method to make 26 Nanometer Computer Chips


February 10th, 2006

Rochester Institute of Technology uses EWL Lithography Method to make 26 Nanometer Computer Chips

Bruce Smith

Bruce Smith, Rochester Institute of Technology (RTI) professor of microelectronic engineering and also the director of the Center for Nanolithography Research in the Kate Gleason College of Engineering, has led a team of engineering students to develop a new process of Nanolithography that uses evanescent wave lithography (EWL) to produce the smallest ever semiconductor device geometry.

Yongfa Fan, who is a doctoral student in RITís Microsystems engineering Ph.D. program, achieved the 26 nanometer size, which was only previously made possible by extreme ultraviolet wavelength methods.  This development advancement in technology is at least five years sooner than projected, based on the International Technology Roadmap for Semiconductors (http://public.itrs.net).


"Immersion lithography has pushed the limits of optical imaging," Smith says. "Evanescent wave lithography continues to extend this reach well into the future. The results are very exciting as images can be formed that are not supposed to exist."

This is the technology of the future, and the EWL method will make developing nanotechnology and microelectronics devices even more prominent in the years to come.

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By Nicole Wilson
Best Syndication Staff Writer



Keywords and misspellings:  nano meter technolgys nano-metre smallest size breakthrew nano-technolgy litography etching

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